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机译:透明的混合聚合物印章副本,具有低于50纳米的分辨率,可用于热和UV纳米压印光刻
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PS1, Switzerland;
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PS1, Switzerland;
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PS1, Switzerland;
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PS1, Switzerland;
Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen PS1, Switzerland;
Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany;
Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany;
Micro Resist Technology GmbH, Koepenicker Str. 325, 12555 Berlin, Germany;
Eulitha AG, 5232 Villigen PSI, Switzerland;
机译:用于高保真度UV-纳米压印光刻的超硬透明杂化纳米复合材料
机译:通过纳米压印光刻技术制造的用于模制的可弯曲混合邮票复制品
机译:大面积UV-纳米压印平版印刷图章的修改和制作
机译:纳米定位的集成软紫外线印刷光刻和纳米卷积机,用于精确定位印章到衬底
机译:通过热诱导相分离和聚合物-金属杂化方法制备的聚合物复合材料和多孔材料。
机译:导电柔性和透明聚合物的石墨烯转移的通用冲压方法
机译:基于大面积印记的紫外纳米压印光刻中衬底变形的影响