Molecularly selective nanopatterns using nanoimprint lithography: A label-free sensor architecture

摘要

Nanoimprint lithography (NIL) can generate well defined nanostructures with high efficiency and at very low cost. Molecular imprinting (MIP) is a "bottom-up" technique creating a polymer layer exhibiting structures with a molecular selectivity. Such polymer structures may be employed as molecular recognition sites for sensing applications. In this work, the authors combine NIL with MIP and they are able to obtain micro-and nanopatterns of polymer with features down to 100 nm that show high molecular selectivity.