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首页> 外文期刊>Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures >Optical and structural characterization of epitaxial graphene on vicinal 6H-SiC(0001)–Si by spectroscopic ellipsometry, Auger spectroscopy, and STM
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Optical and structural characterization of epitaxial graphene on vicinal 6H-SiC(0001)–Si by spectroscopic ellipsometry, Auger spectroscopy, and STM

机译:光谱椭偏仪,俄歇光谱仪和STM表征邻域6H-SiC(0001)-Si上外延石墨烯的光学和结构表征

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The authors report results of spectroscopic ellipsometry (SE) measurements in the near-IR, visible, and near-UV spectral ranges using a Woollam dual rotating-compensator ellipsometer, analyzing data in terms of both epitaxial graphene and interface contributions. The SiC samples were cleaned by standard methods of CMP and HF etching prior to mounting in UHV and growing epitaxial graphene by thermal annealing at ∼1400 °C. Most samples were vicinally cut 3.5° off (0001) toward [11-20]. STM measurements show that the initial regular step edges were replaced by somewhat irregular edges after graphene growth. From growth-temperature and Auger data the authors estimate that the graphene is ∼3–4 ML thick. The authors find significant differences among the spectral features of the interface “buffer” layer and those of graphene. Specifically, the hyperbolic-exciton peak reported previously at ∼4.5 eV in graphene shifts to a similarly shaped peak at ∼4 eV in the interface buffer layer. The authors attribute this shift to a significant component of sp3 bonded carbon in the buffer, which occurs in addition to the sp2 bonded carbon that is present in the graphene layer. SE data in the terahertz range obtained by Hoffman etal [Thin Solid Films 519, 2593 (2011)] show that the mobility values of graphene grown on the carbon face of SiC vary with proximity to the substrate. This leads to the question as to whether an interface layer at the Si face has properties (i.e., dielectric function/complex refractive index) that are different from and/or affect those of the graphene layers.
机译:作者报告了使用Woollam双旋转补偿椭圆仪在近红外,可见光和近紫外光谱范围内的椭圆偏振光谱(SE)测量结果,分析了外延石墨烯和界面贡献方面的数据。 SiC样品通过CMP和HF蚀刻的标准方法清洗,然后安装在特高压中,并通过在约1400°C的温度下进行热退火生长外延石墨烯。大部分样品朝(11-20)方向从(0001)切开3.5°。 STM测量表明,石墨烯生长后,初始规则台阶边缘被不规则边缘替代。根据生长温度和俄歇数据,作者估计石墨烯的厚度约为3-4 ML。作者发现界面“缓冲”层的光谱特征与石墨烯的光谱特征之间存在显着差异。具体而言,先前在石墨烯的约4.5 eV处报告的双曲线激子峰在界面缓冲层中的相似形状的峰在约4 eV处发生了移动。作者将这种变化归因于缓冲液中sp 3 键合碳的重要组成部分,除了石墨烯层中存在sp 2 键合碳之外,还发生了这种变化。 Hoffman等人[Thin Solid Films 519,2593(2011)]获得的太赫兹范围内的SE数据表明,生长在SiC碳表面上的石墨烯的迁移率值随与基底的接近程度而变化。这引起了关于Si面处的界面层是否具有不同于和/或影响石墨烯层的那些特性(即,介电功能/复数折射率)的问题。

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