Benchmarking stencil reticles for electron projection lithography

摘要

Electron projection lithography (EPL) is one of the leading candidates for next-generation lithography at the 65 nm lithography node, particularly for contact levels. This article describes the results of an experimental effort to benchmark the current state of EPL stencil mask making. In this article, we report on the current status of the data handling software needed to pattern an EPL stencil reticle, EPL stencil reticle repair techniques, and EPL stencil mask stability following prolonged electron-beam irradiation.