首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structure >Fabrication of an integrated nanofluidic chip using interferometric lithography
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Fabrication of an integrated nanofluidic chip using interferometric lithography

机译:使用干涉光刻技术制造集成纳米流体芯片

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The fabrication of nanoscale structures with dimensions approaching the scale of biological molecules offers approaches to the study of fluid dynamics and biomolecular transport. Ultimately, a parallel lithographic approach will be necessary if devices based on these nanofluidics are to achieve widespread availability and acceptance. We report on a flexible, all-optical lithography alternative that is amenable to large-scale production. We use interferometric lithography (IL) and anisotropic etching to produce large areas of parallel, nanofluidic channels with widths of ~ 100 nm and depths of up to 500 nm. We also use standard optical lithography to create interfacing microchannels, such that the range of spatial scales on one chip varies by 10~4 (from mm scale reservoirs to 100 nm nanochannels). We provide initial demonstrations of capillary action and electrophoretic motion of fluorescent dye solutions.
机译:尺寸接近生物分子规模的纳米级结构的制造提供了研究流体动力学和生物分子运输的方法。最终,如果基于这些纳米流体的器件要获得广泛的可用性和接受度,则必须采用并行光刻方法。我们报告了适用于大规模生产的灵活的全光学光刻替代方法。我们使用干涉光刻(IL)和各向异性蚀刻来产生大面积的平行纳米流体通道,其宽度约为100 nm,深度最高为500 nm。我们还使用标准的光刻技术来创建接口微通道,从而使一个芯片上的空间尺度范围变化10〜4(从毫米级的储库到100纳米的纳米通道)。我们提供荧光染料溶液的毛细管作用和电泳运动的初步演示。

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