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首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >1.32 μm InAs/GaAs quantum-dot resonant-cavity light-emitting diodes grown by metalorganic chemical vapor deposition
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1.32 μm InAs/GaAs quantum-dot resonant-cavity light-emitting diodes grown by metalorganic chemical vapor deposition

机译:金属有机化学气相沉积生长的1.32μmInAs / GaAs量子点谐振腔发光二极管

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摘要

The first demonstration of InAs/GaAs quantum-dot (QD) resonant-cavity light-emitting diode (RCLED) operating at 1.32 μm at room temperature is reported. A single-layer InAs QDs inserted in GaAs matrix as the active medium was grown by metalorganic chemical vapor deposition. The bottom and top mirrors of QD RCLEDs were fabricated by employing epitaxial AlGaAs/GaAs pairs and one dielectric SiO_2/Si_3N_4 pair as distributed Bragg reflectors (DBRs), respectively. As compared to the nonresonant QD LEDs, the RCLEDs exhibit a forward voltage of 1.13 V at 20 mA, a peak wavelength of 1.318 μm, a narrower full width at half maximum in the electroluminescent spectrum of 14 meV at 20 mA, a high Q factor of 73.9, a low redshift rate with injection current of 0.033 nm/mA, and a higher light-output power of 28 μW at 100 mA.
机译:报道了在室温下以1.32μm工作的InAs / GaAs量子点(QD)谐振腔发光二极管(RCLED)的首次演示。通过金属有机化学气相沉积法,将作为活性介质插入GaAs基质中的单层InAs QD进行了生长。 QD RCLED的底部和顶部反射镜分别采用外延AlGaAs / GaAs对和一个电介质SiO_2 / Si_3N_4对作为分布式布拉格反射器(DBR)制成。与非谐振QD LED相比,RCLED在20 mA时的正向电压为1.13 V,峰值波长为1.318μm,在20 mA时的电致发光光谱中的半峰宽较窄,半峰为14 meV,Q值较高电流为73.9,低红移速率,注入电流为0.033 nm / mA,在100 mA下的光输出功率更高,为28μW。

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