首页> 外文期刊>Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures >Electron-beam evaporated cobalt films on molecular beam epitaxy prepared GaAs(001)
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Electron-beam evaporated cobalt films on molecular beam epitaxy prepared GaAs(001)

机译:分子束外延制备电子束蒸发钴膜GaAs(001)

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摘要

We have deposited Co films on the GaAs(001) surface by using an e-beam evaporation method. The thicknesses of the Co films are measured by using x-ray reflectivity and Rutherford backscattering. The magnetic properties of the films have been measured using superconducting quantum interference device. The magnetization of the films was found to decrease with increasing film thickness. The slight degradation of magnetic properties is attributed to increasing roughness on the Co surface or the Co/GaAs interface during the Co deposition. (C) 2004 American Vacuum Society.
机译:我们使用电子束蒸发方法在CoAs(001)表面上沉积了Co膜。通过使用X射线反射率和卢瑟福反向散射来测量Co膜的厚度。已使用超导量子干涉仪测量了薄膜的磁性。发现膜的磁化强度随着膜厚度的增加而降低。磁性的轻微降低归因于在Co沉积过程中Co表面或Co / GaAs界面上粗糙度的增加。 (C)2004年美国真空学会。

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