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首页> 外文期刊>Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films >Luminescent properties and structural characteristics of sputter-deposited ZnGa2O4:Mn phosphor thin films
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Luminescent properties and structural characteristics of sputter-deposited ZnGa2O4:Mn phosphor thin films

机译:溅射沉积ZnGa2O4:Mn荧光粉薄膜的发光特性和结构特征

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The correlation between the luminescent properties and structural characteristics of ZnGa2O4:Mn phosphor thin films has been investigated. The ZnGa2O4:Mn films have been prepared by radio frequency planar magnetron sputter deposition from a 2 mol. % Mn-doped ZnGa2O4 target in an Ar-O2 gas mixture whose pressure ranged between 2 and 20 mTorr. Films deposited at gas pressures above 10 mTorr showed a random crystallographic orientation, while the films deposited ≤10 mTorr exhibited a preferential orientation of the [110] direction perpendicular to the film surface. Internal stress in the ZnGa2O4:Mn films became increasingly compressive upon decreasing the gas pressure, reaching a value of ∼1.7 × 1010 dyne/cm2 at 2 mTorr. The observed change in internal stress correlated with the changes in the crystalline structure of the films. After a post-deposition anneal at 800 °C, the crystallinity of the films was improved. The rms surface roughness of the annealed ZnGa2O4:Mn films did not systematically depend on the gas pressure. Both photoluminescence (PL) and cathodoluminescence (CL) resulted in green light, and the emission peaked at ∼505 nm. This was attributed to the Mn2+ 3d-3d intrashell 4T1 → 6A1 transition. The intensities of both PL and CL emission increased as the gas pressure decreased, presumably due to the better crystalline quality with a highly [110]-textured structure and a more densely-packed microstructure in the ZnGa2O4:Mn films deposited at lower pressures.
机译:研究了ZnGa2O4:Mn荧光粉薄膜的发光特性与结构特性之间的相关性。 ZnGa2O4:Mn薄膜是通过射频平面磁控管溅射沉积法从2 mol膜制备的。压力介于2到20毫托之间的Ar-O2气体混合物中的Mn掺杂的ZnGa2O4靶百分比。在高于10 mTorr的气压下沉积的薄膜显示出随机的晶体学取向,而沉积≤10 mTorr的薄膜则显示出垂直于薄膜表面的[110]方向的优先取向。随着气压的降低,ZnGa2O4:Mn薄膜的内部应力变得越来越压缩,在2 mTorr时达到1.7×10 10 达因/ cm 2 的值。观察到的内部应力变化与薄膜的晶体结构变化相关。在800°C下进行沉积后退火后,薄膜的结晶度得到改善。退火的ZnGa2O4:Mn膜的均方根表面粗糙度并不系统地取决于气压。光致发光(PL)和阴极发光(CL)均产生绿光,并且发射在〜505 nm达到峰值。这归因于Mn 2 + 3d-3d壳内 4 T1→ 6 A1的转变。 PL和CL的发射强度均随气压的降低而增加,这可能是由于在较低压力下沉积的ZnGa2O4:Mn膜具有较高的[110]织构化结构和更高密度的微观结构所致的良好结晶质量。

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