On stability of self-assembled nanoscale patterns

摘要

We conduct linear and nonlinear stability analyses on a paradigmatic model of nanostructure self-assembly. We focus on the spatio-temporal dynamics of the concentration field of deposition on a substrate. The physical parameter of interest is the mean concentration C_0 of the monolayer. Linear stability analysis of the system shows that a homogeneous monolayer is unstable when C_0 lies within a band symmetric about C_0 = 1/2. On increasing C_0 from zero, the homogeneous solution destabilizes to a hexagonal array, which then transitions to stripes. Transitions to and from the hexagonal state are subcritical. Square patterns are unstable for all values of C_0 transitioning either to hexagons or stripes. Further, we present stability maps for striped arrays by considering possible instabilities. The analytical results are confirmed by numerical integrations of the Suo-Lu model. Our formalism provides a theoretical framework to understand guided self-assembly of nanostructures.