N_2 Tunnel Wafer Transport System

摘要

A wafer transport system has been developed for application to the next generation of VLSI manufacturing processes. In this system, various kinds of wafers ranging from 8 to 12 in. are floated on a gas film to be transported through an ultraclean N_2 gas environment with no solid contact. A sensor controls the movement of the transported wafer on the control unit precisely and rapidly (i.e., a sensor instantly detects and recognizes the configuration of the wafer and lets the wafer stop, facing in the right direction. In this ultraclean N_2 gas environment, the wafer surface is free fromparticle contamination and growth of native oxide. Furthermore, moving the electrostatic clamping device on the track, and the jet flow of ultraclean N_2 gas against the track, allows self-cleaning of the wafer transport track.