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首页> 外文期刊>Journal of Superconductivity and Novel Magnetism >Effect of Annealing Time and Temperature on Microstructural and Superconducting Properties of (Bi,Pb)-2212 Thin Films Produced by Magnetron Reactive Sputtering
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Effect of Annealing Time and Temperature on Microstructural and Superconducting Properties of (Bi,Pb)-2212 Thin Films Produced by Magnetron Reactive Sputtering

机译:退火时间和温度对磁控反应溅射制备(Bi,Pb)-2212薄膜的微结构和超导性能的影响

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摘要

This study deals with the role of various annealing time (1 h, 2 h, 4 h, 6 h and 8 h) and temperature (840 and 850 °C) on the microstructural and superconducting properties of thin films with the aid of scanning electron microscopy (SEM), X-Ray analysis (XRD), electron dispersive X-Ray (EDX), resistivity and transport critical current density (J c ) measurements. The T c , J c , variation of transition temperatures, hole-carrier concentration, grain size, phase purity, lattice parameter, surface morphology, element distribution, crystallinity and resistivity (at room temperature) values of the films prepared are compared with each other. Critical transition temperatures (T c ) of the samples are deduced from the dc resistivity measurement while critical current density values are estimated from the critical current and total cross-sectional area values. It is found that maximum T c of 79.7 K and J c of 1520 A/cm2 are observed for the film annealed at 840 °C for 6 h as against 54.9 K and 30 A/cm2 (minimum values), respectively, for the film annealed at 840 °C for 4 h. Moreover, SEM images indicate that the former has the best crystallinity, grain connectivity and largest grain size. Based on these results, T c and J c values of the samples studied are found to depend strongly on the microstructure. Additionally, EDX results show that the elements used for the preparation of all the samples are observed to distribute homogeneously. As for the XRD results, all the samples exhibit the polycrystalline superconducting phase with the changing intensity of diffraction lines. According to the refinement of cell parameters done by considering the structural modulation, the largest lattice parameter a and c are obtained for the film annealed at 840 °C for 8 h. To sum up, the aim of the present study is not only to investigate the changes of microstructural and superconducting properties of the samples fabricated in the varied time and temperature but to determine the best ambient for the film fabrication and show the feasibility of obtaining Bi-2212 film with tailored structure, as well.
机译:本研究利用扫描电子研究了各种退火时间(1 h,2 h,4 h,6 h和8 h)和温度(840和850°C)对薄膜的微结构和超导性能的作用。显微镜(SEM),X射线分析(XRD),电子弥散X射线(EDX),电阻率和传输临界电流密度(J c )测量。 T c ,J c ,转变温度的变化,空穴载流子浓度,晶粒尺寸,相纯度,晶格参数,表面形态,元素分布,结晶度和电阻率(在室温下)值将准备的电影相互比较。样品的临界转变温度(T c )由直流电阻率测量值推导出,而临界电流密度值则由临界电流和总截面积值估算得出。发现在840°C下退火6 h的薄膜的最高T c 为79.7 K,J c 为1520 A / cm2 ,而54.9 K和30 A / cm2 (最小值),分别表示在840°C下退火4小时的薄膜。此外,SEM图像表明前者具有最佳的结晶度,晶粒连通性和最大的晶粒尺寸。根据这些结果,发现所研究样品的T c 和J c 值在很大程度上取决于微观结构。另外,EDX结果表明,用于制备所有样品的元素被观察到分布均匀。至于XRD结果,所有样品均表现出多晶超导相,且衍射线的强度发生变化。根据考虑结构调制的晶胞参数的细化,获得了在840°C退火8 h的薄膜的最大晶格参数a和c。综上所述,本研究的目的不仅在于研究在不同的时间和温度下制备的样品的微观结构和超导性能的变化,而且还确定了薄膜制备的最佳环境并证明了获得Bi-同样具有定制结构的2212电影。

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