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首页> 外文期刊>Journal of Russian laser research >DESIGN AND ANALYSIS OF A GaAs-BASED 850-nm VERTICAL-CAVITY SURFACE-EMITTING LASER WITH DIFFERENT DOPING IN THE REFLECTION REGIONS
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DESIGN AND ANALYSIS OF A GaAs-BASED 850-nm VERTICAL-CAVITY SURFACE-EMITTING LASER WITH DIFFERENT DOPING IN THE REFLECTION REGIONS

机译:基于GaAs的反射区内不同掺杂的850 nm垂直腔表面激光的设计与分析

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摘要

The present paper deals with the analysis of a non-oxide type of vertical-cavity surface-emitting laser (VCSEL) for operation at 850 nm. The modeling and characterization of the VCSEL is presented in the context of design considerations. Efforts are made to emphasize the behavioral features of the proposed VCSEL, in view of the analytical investigation, which has been performed through a series of simulations for various relevant parameters that are vital for the determination of the VCSEL characteristics. Some of these parameters are the intensity and refractive-index distributions, gain response, spontaneous emission, material gain variations, etc. The results obtained are compared with the oxide-confined VCSEL. It is observed that the proposed model of the VCSEL is suitable at the operating wavelength of 850 nm.
机译:本文研究了用于850 nm工作的非氧化物型垂直腔面发射激光器(VCSEL)的分析。 VCSEL的建模和表征是出于设计考虑的考虑。鉴于分析研究,已努力强调拟议的VCSEL的行为特征,该分析已通过对确定VCSEL特性至关重要的各种相关参数的一系列模拟进行。其中一些参数是强度和折射率分布,增益响应,自发发射,材料增益变化等。将所得结果与氧化物限制的VCSEL进行比较。可以看出,所提出的VCSEL模型适用于850 nm的工作波长。

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