Conduction properties of highly conductive a-Si:H:Y alloy films at low temperature

摘要

Conductive n-type a-Si:H:Y alloy films with the conductivity as high as 60 S/cm have been deposited on Si substrate by radio frequency sputtering. In the temperature range 20～ 300 K, for samples with large Y contents, the thermally activated conduction is also observed and the plots of lgσ vs. 1/T can be fitted by two linear functions with different slopes. The corre- sponding temperatures of the kinks between the two straight lines depend on the Y contents in the samples.