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Pinhole-Free PbS Thin Film Production Using a Low-Temperature Chemical Bath Deposition Method

机译:使用低温化学浴沉积法生产针孔PBS薄膜生产

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In this study, PbS thin films were produced at a low temperature such as 15C. using the chemical bath deposition (CBD) method.0.0085 M Pb (NO3)2 and 0.1460 M NaOH were dissolved in 100ml deionized water. 0.510 M thiourea which would be added to the solution was divided into 10 portions and added at zero, two, four, six and eight-minute intervals. Structural analysis of the obtained samples was carried out from XRD patterns which showed a significant increase in the peak intensity of the films obtained by adding thiourea at intervals of four and six minutes. The surface morphologies of the films were analyzed using a scanning electron microscope. According to the SEM images, when thiourea was added to the solution at intervals of four minutes, no cracks and holes were formed on the surfaces of the films obtained.
机译:在该研究中,PBS薄膜在低温下制造,例如15℃。使用化学浴沉积(CBD)方法.0.0085M Pb(NO 3)2和0.1460m NaOH溶解在100ml去离子水中。将添加到溶液中的0.510米硫脲分为10份,并在零,两,四,六个和八分钟间隔中添加。所得样品的结构分析由XRD图案进行,该XRD图案表现出通过以四和六分钟的间隔添加硫脲而获得的膜的峰强度的显着增加。使用扫描电子显微镜分析膜的表面形态。根据SEM图像,当以四分钟的间隔加入硫脲时,在获得的薄膜的表面上没有形成裂缝和孔。

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