Dual-dome micromechanical resonator fabricated with reactive ion etching and plasma-enhanced chemical vapor deposition techniques

摘要

A novel dual-dome micromechanical resonator and a methodnfor fabricating it into a single or amorphous crystal silicon film layer isndemonstrated. An electrostatic effect on the input resonator inducesnhigh-frequency resonant mechanical motion in the first dome plate,nwhich is mechanically conducted into the second equivalent dome plate.nTransduction from the input resonator to the output resonator is me-nchanically performed not by using coupling rods but by overlapping thenplates. Oscillations are obtained at 8.5 MHz and 17 MHz when the reso-nnator is buffered with a high-impedance junction gate field-effect transis-ntor amplifier