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机译:分步重复紫外纳米压印光刻技术用于15纳米以下图案的多层剥离工艺
aBeam Technologies Inc., 22290 Foothill Boulevard, Suite 2, Hayward, California 94541, United States;
Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States;
Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States;
Instituto de Microelectronica de Barcelona Campus UAB, Bellaterra, Barcelona 08193, Spain;
Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States;
Micro Resist Technology, Kopenicker Street 325, Berlin D-12555, Germany;
Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States;
aBeam Technologies Inc., 22290 Foothill Boulevard, Suite 2, Hayward, California 94541, United States;
Molecular Foundry, Lawrence Berkeley National Laboratory, 67 Cyclotron Road, Berkeley, California 94720, United States;
nanoimprint; etching; metallic nanostructure; lift-off;
机译:使用逐元素图案化印章的分步重复UV纳米压印光刻工艺
机译:紫外纳米压印光刻工艺制备零模波导
机译:使用双层紫外纳米压印光刻技术和甲基丙烯酰氧基丙基封端的聚二甲基硅氧烷基压印树脂进行剥离工艺
机译:基于紫外线的光刻剥离技术在纳米机电系统中应用锆钛酸铅(PZT)纳米级图案化
机译:用于功能聚合物图案化的纳米压印光刻
机译:通过分步重复热纳米压印光刻技术实现的集成3D水凝胶波导输出耦合器:一种有前途的水和pH传感器设备
机译:纳米玻璃用于纳米镜电极阵列的纳米压印多层剥离工艺的评价