Process highlights to enhance directed self-assembly contact patterning performances

摘要

We focus on the directed self-assembly (DSA) for contact hole (CH) patterning application using poly-styrene-b-poly(methyl methacrylate) (PS-b-PMMA) block copolymers (BCPs). By employing the DSA planari-zation process, we highlight the DSA advantages for CH shrink, repair, and multiplication, which are extremely needed to push forward the limits of currently used lithography. Meanwhile, we overcome the issue of pattern density-related defects that are encountered with the commonly used graphoepitaxy process flow. Our study also aims to evaluate the DSA performances as functions of material properties and process conditions by monitoring main key manufacturing process parameters: CD uniformity (CDU), placement error (PE), and detectivity [hole open yield (HOY)]. Concerning process, it is shown that the control of surface affinity and the optimization of self-assembly annealing conditions enable significant enhancement of CDU and PE. Regarding material properties, we show that the best BCP composition for CH patterning should be set at 70/30 of PS/PMMA total weight ratio. Moreover, it is found that increasing the PS homopolymer content from 0.2% to 1 % has no impact on DSA performances. Using a C35 BCP (cylinder-forming BCP of natural period L_0 = 35 nm), good DSA performances are achieved: CDU-3_σ = 1.2 nm, PE-3_σ = 1.2 nm, and HOY = 100%. Finally, the stability of DSA process is also demonstrated through the process follow-up on both patterned and unpatterned surfaces over several