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首页> 外文期刊>Journal of microanolithography, MEMS, and MOEMS >Need for LWR metrology standardization: the imec roughness protocol
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Need for LWR metrology standardization: the imec roughness protocol

机译:LWR计量标准化的需求:imec粗糙度协议

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As semiconductor technology keeps moving forward, undeterred by the many challenges ahead, one specific deliverable is capturing the attention of many experts in the field: line width roughness (LWR) specifications are expected to be <2 nm in the near term, and to drop below 1 nm in just a few years. This is a daunting challenge and engineers throughout the industry are trying to meet these targets using every means at their disposal. However, although current efforts are surely admirable, we believe they are not enough. The fact is that a specification has a meaning only if there is an agreed methodology to verify if the criterion is met or not. Such standardization is critical in any field of science and technology and the question that we need to ask ourselves today is whether we have a standardized LWR metrology or not. In other words, if a single reference sample were provided, would everyone measuring it get reasonably comparable results? We came to realize that this is not the case and that the observed spread in the results throughout the industry is quite large. In our opinion, this makes the comparison of LWR data among institutions, or to a specification, very difficult. We report the spread of measured LWR data across the semiconductor industry. We investigate the impact of image acquisition, measurement algorithm, and frequency analysis parameters on LWR metrology. We review critically some of the International Technology Roadmap for Semiconductors (ITRS) metrology guidelines [such as measurement box length >2 μm and the need to correct for scanning electron microscope (SEM) noise]. We compare the SEM roughness results to AFM measurements. Finally, we propose a standardized LWR measurement protocol-the imec roughness protocol-intended to ensure that every time LWR measurements are compared (from various sources or to specifications), the comparison is sensible and sound. We deeply believe that the industry is at a point where it is imperative to guarantee that when talking about a critical parameter such as LWR, everyone speaks the same language, which is not currently the case.
机译:随着半导体技术的不断发展,不受未来挑战的困扰,一种可交付成果正在吸引本领域许多专家的注意力:线宽粗糙度(LWR)规范在短期内预计将<2 nm,并且将会下降在短短几年内低于1 nm。这是一个艰巨的挑战,整个行业的工程师都在努力使用各种可用的手段来实现这些目标。但是,尽管目前的努力确实令人钦佩,但我们认为还不够。事实是,只有在存在用于验证标准是否符合的商定方法时,规范才有意义。这种标准化在任何科学技术领域都至关重要,我们今天需要问自己的问题是我们是否具有标准化的轻水堆计量学。换句话说,如果只提供一个参考样品,那么每个测量它的人都会得到合理可比的结果吗?我们开始意识到事实并非如此,而且观察到的结果在整个行业中的分布相当大。我们认为,这使得比较机构之间的LWR数据或与规范进行比较非常困难。我们报告了测得的LWR数据在整个半导体行业的分布。我们研究了图像采集,测量算法和频率分析参数对轻水堆计量的影响。我们严格审查了一些国际半导体技术路线图(ITRS)度量准则[例如,测量盒长度> 2μm,以及需要校正扫描电子显微镜(SEM)噪声]。我们将SEM粗糙度结果与AFM测量结果进行比较。最后,我们提出了一个标准化的LWR测量协议(即imec粗糙度协议),目的是确保每次比较LWR测量值(从各种来源或到规格)时,比较是合理而合理的。我们深信,该行业正处于当务之急,必须保证在谈论诸如LWR之类的关键参数时,每个人都使用相同的语言,而目前并非如此。

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