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Synthesized silicon-substituted hydroxyapatite coating on titanium substrate by electrochemical deposition

机译:电化学沉积在钛基体上合成硅取代羟基磷灰石涂层

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摘要

Silicon-substituted hydroxyapaptite (Si-HA) coatings were prepared on titanium substrates by electrolytic deposition technique in electrolytes containing Ca~(2+), PO_4~(3-) and SiO_3~(2-) ions with various SiO_3~(2-)/(PO_4~(3-)+ SiC>_3~(2-)) molar ratios(n_(si)). The deposition was all conducted at a constant voltage of 3.0 V, with titanium substrate as cathode and platinum as anode, for 1 h at 85°C. The coatings thus prepared were characterized with inductively coupled plasma (ICP), X-ray diffraction (XRD), fourier transform infrared spectroscopy (FTIR), field-emission-type scanning electron microscope (FSEM). The results show that the silicon amount in the coatings increases linearly to about 0.48 wt% at first with increasing n_(si) between 0 and 0.03, then increases slowly to about 0.55 wt% between 0.03 and 0.10 and finally maintains almost at a level around 0.55 wt% between 0.10 and 0.30. The tree-like Si-HA crystals are observed in the coatings prepared in the electrolyte of n_(si) = 0.20. And the presence of silicon in electrolytes decreases the thickness of the coatings, with effect being more significant as n_(si) increased. Additionally, the substitution of Si causes some OH~- loss and changes the lattice parameters of hydroxyapatite (HA).
机译:在含有Ca〜(2 +),PO_4〜(3-)和SiO_3〜(2-)离子以及各种SiO_3〜(2-)的电解质中,通过电解沉积技术在钛基底上制备了硅取代的羟基磷灰石(Si-HA)涂层。 )/(PO_4〜(3-)+ SiC> _3〜(2-))摩尔比(n_(si))。所有沉积均在3.0 V的恒定电压下进行,其中钛基底为阴极,铂为阳极,在85°C下进行1 h。如此制备的涂层用电感耦合等离子体(ICP),X射线衍射(XRD),傅立叶变换红外光谱(FTIR),场发射型扫描电子显微镜(FSEM)表征。结果表明,涂​​层中的硅含量首先线性增加至约0.48 wt%,且n_(si)在0至0.03之间增加,然后缓慢增加至约0.55 wt%,在0.03至0.10之间,最后保持几乎在水平附近。 0.10至0.30之间的重量百分比为0.55。在n_(si)= 0.20的电解质中制备的涂层中观察到树状Si-HA晶体。电解质中硅的存在会降低涂层的厚度,并且随着n_(si)的增加,效果会更加显着。另外,Si的取代引起一些OH-损失并改变了羟基磷灰石(HA)的晶格参数。

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  • 来源
    《Journal of materials science》 |2011年第5期|p.1205-1211|共7页
  • 作者单位

    Department of Materials Science and Engineering,Zhejiang University, Hangzhou 310027, China;

    The Stomatology Center of the First Affiliated Hospital of Zhejiang University, Hangzhou 310003, China;

    Department of Materials Science and Engineering,Zhejiang University, Hangzhou 310027, China;

    Department of Materials Science and Engineering,Zhejiang University, Hangzhou 310027, China;

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