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首页> 外文期刊>Journal of materials science >Development of CuInSe_2 thin films by SELD method for photovoltaic absorber layer application
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Development of CuInSe_2 thin films by SELD method for photovoltaic absorber layer application

机译:用于光伏吸收层应用的Cuinse_2薄膜的开发

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摘要

CuInSe_2 (CIS) films were obtained on annealing of 280 nm and 775 nm thick Cu/In/Se stacks deposited on corning glass substrate. The stacked elemental layer deposition (SELD) technique was used for the deposition of the films of Se, In and Cu layers. The as-deposited and annealed samples were found to possess polycrystalline structures. The films provided dominating CIS phase along with secondary phases of Cu_(11)In_9, CuSe and Se. The secondary phases present in the films vary with change in annealing temperatures. Moreover, single CuInSe_2 phase is observed in the 280 nm films at 523 K. The scanning electron microscopic images of the samples show nano-rod type structures of CIS grains. The elemental composition of Cu:In:Se approaches 1:1:2 in 280 nm thick samples. The ratio, however, deviates in the 775 nm thick films. The Raman spectra of these samples give A_l mode at 173 cm~(-1) and confirm the presence of CIS phase. The films exhibit slow increase in the band gap (E_g) values from 1.09 to 1.22 eV for 775 films. However, comparatively higher band gap (E_g) values from 1.25 to 1.90 eV are observed for 280 nm films with high absorption co-efficient (α~ 10~5 cm~(-1)) values. The films present more useful electrical parameters for 280 nm thick samples as compared to 775 nm samples due to dominated CIS phase. Thus, obtained CIS thin films of 280 nm thickness provide viable alternative as an absorber layer in solar cell structure.
机译:在退火的280nm和775nm厚的Cu / In / Se堆叠上获得CuinSe_2(CIS)膜在康宁玻璃基板上的退火上获得。堆叠的元素层沉积(SELD)技术用于沉积SE,IN和Cu层的膜。发现沉积的和退火样品具有多晶结构。将薄膜提供占据CIS相以及CU_(11)IN_9,CUSE和SE的二次相。薄膜中存在的二次相随退火温度的变化而变化。此外,在523k的280nm膜中观察到单一CuinSe_2相。样品的扫描电子显微镜图像显示了CIS颗粒的纳米棒型结构。 Cu的元素组成:In:Se在280nm厚的样品中接近1:1:2。然而,该比率偏离在775nm厚的薄膜中。这些样品的拉曼光谱在173cm〜(-1)下给予A_L模式,并确认CIS相的存在。对于775件薄膜,薄膜从1.09到1.22 EV的带隙(E_G)值缓慢增加。然而,对于具有高吸收的高效(α〜10〜5cm〜(-1))值,观察到从1.25至1.90eV的比较较高的带隙(E_G)值。由于主导的顺式相位,薄膜为280nm厚的样品呈现了280nm厚的样品的更多有用的电参数。因此,获得的CIS薄膜为280nm的厚度提供可行的替代物作为太阳能电池结构中的吸收层。

著录项

  • 来源
    《Journal of materials science》 |2020年第4期|3172-3183|共12页
  • 作者单位

    Department of Physics University of Jammu Jammu J&K 180006 India;

    Department of Physics University of Jammu Jammu J&K 180006 India;

    Department of Physics University of Jammu Jammu J&K 180006 India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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