机译:射频磁控溅射沉积的(Pb_(0.92)La_(0.08))(Zr_(0.65)Ti_(0.35))O_(3)薄膜的铁电和光学性质
State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science, Chengdu 610054, P.R. China;
机译:激光烧蚀(Pb_(0.92)La_(0.08))(Zr_(0.65)Ti_(0.35))O_3-高级哈氏合金上的薄膜的结构,铁电和介电性能的相关性
机译:偏振疲劳对松弛剂Pb_(0.92)La_(0.08)Zr_(0.65)Ti_(0.35)O_3薄膜的电热效应
机译:在镍箔上生长的铁电体Pb_(0.92)La_(0.08)Zr_(0.52)Ti_(0.48)O_δ膜的温度依赖性极化转换特性
机译:无机低温烧结电热量效应(PB_(0.88)LA_(0.08))(Zr_(0.65)Ti_(0.35))O3陶瓷
机译:通过大功率脉冲磁控溅射沉积的银膜的电学和光学性质。
机译:在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
机译:热诱导氧序对Gd_(2)(Ti_(0.65)Zr_(0.35))_(2)O_(7)中离子迁移的影响
机译:通过mOCVD和RF溅射制备的srTiO(sub 3)(100)上异质外延pb(Zr(sub 0.35)Ti(sub 0.65))O(sub 3)/ srRuO(sub 3)多层薄膜的结构和性质