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机译:热退火对化学浴沉积硒化锌薄膜性能的影响
Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;
Department of Chemistry, J.S.M. College, Alibag 402201, Maharashtra, India;
Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;
Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;
Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;
机译:光辅助化学浴沉积沉积的硒化锌薄膜的退火时间的影响
机译:光辅助化学浴法沉积的硒化型薄膜的相变性:退火温度的影响
机译:沉积,退火温度和时间对化学浴沉积技术生长的硒化镉(CdSe)薄膜的光学和固态特性的影响
机译:通过化学浴沉积获得的热退火CdS薄膜的电性能
机译:真空沉积锡,锑化锡和硒化锌,氧化锌薄膜的电子光学研究。
机译:退火温度对化学浴镀(CBD)技术在低溶液浓度下沉积的CdS薄膜光学光谱的影响
机译:化学浴沉积技术沉积硒化铜薄膜的结构,电学和光学性质