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Effect of thermal annealing on properties of zinc selenide thin films deposited by chemical bath deposition

机译:热退火对化学浴沉积硒化锌薄膜性能的影响

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摘要

Zinc selenide films have been deposited on glass substrate by chemical bath deposition method. The resultant films were annealed up to 473 K temperature. The structural properties of zinc selenide thin films have been investigated by X-ray diffraction techniques. The X-ray diffraction spectra showed that zinc selenide thin films are polycrystalline and have a cubic structure. The most preferential orientation is along the (111) direction for all films. The lattice parameter, grain size, and microstrain were calculated and correlated with annealing temperature. The optical properties showed direct band gap values were found to be in the region of 2.69-2.81 eV. The electrical studies shows conductivity increases with increase in annealing temperature. The optoelectric and structural data are discussed from the point of applications based on achieving high performance devices.
机译:硒化锌膜已经通过化学浴沉积法沉积在玻璃基板上。将所得膜退火至473 K温度。已经通过X射线衍射技术研究了硒化锌薄膜的结构特性。 X射线衍射光谱表明硒化锌薄膜是多晶的并且具有立方结构。对于所有膜,最优选的取向是沿着(111)方向。计算晶格参数,晶粒尺寸和微应变并与退火温度相关。光学性质显示直接带隙值被发现在2.69-2.81eV的范围内。电气研究表明,电导率随退火温度的升高而增加。在实现高性能器件的基础上,从应用角度讨论了光电数据和结构数据。

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  • 来源
    《Journal of materials science 》 |2008年第5期| 374-379| 共6页
  • 作者单位

    Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;

    Department of Chemistry, J.S.M. College, Alibag 402201, Maharashtra, India;

    Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;

    Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;

    Department of Chemistry, Solid State Research Laboratory, Shivaji University, Kolhapur 416004, Maharashtra, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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