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机译:射频磁控溅射制备成分梯度(Ba,Sr)TiO_3薄膜的微观结构,光学和介电性能
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
Jiangxi Key Laboratory of Surface Engineering, Jiangxi Science and Technology Normal University, Nanchang 330013, People's Republic of China;
机译:射频磁控溅射制备Ba_(0.65)Sr_(0.35)TiO_3薄膜的微观结构和光学性质
机译:沉积温度对射频磁控溅射沉积Ba_(0.6)Sr_(0.4)TiO_3薄膜的微观结构和介电性能的影响
机译:底部电极对组成梯度(Ba_(1-x)Sr_x)TiO_3薄膜的微观结构和介电性能的依赖性
机译:原位直流偏置对RF磁控反应溅射(BA,SR)TiO {Sub} 3膜的组成,微结构和介电性能的影响
机译:射频磁控溅射未掺杂镧锰矿薄膜的结构,磁性和表面特性。
机译:射频磁控溅射制备(MgAl)共掺杂ZnO薄膜的光电性能研究与研究
机译:制备参数对RF磁控溅射沉积MGO薄膜的结晶,微观结构,表面组成和光学性能的影响