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首页> 外文期刊>Journal of materials science >Photoconductivity and diode effect in Bi rich multiferroic BiFeO_3 thin films grown by pulsed-laser deposition
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Photoconductivity and diode effect in Bi rich multiferroic BiFeO_3 thin films grown by pulsed-laser deposition

机译:脉冲激光沉积生长富Bi多铁性BiFeO_3薄膜的光电导和二极管效应

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摘要

Bismuth ferrite, BiFeO_3, is almost the only material that is simultaneously magnetic and a strong ferroelectric at room temperature. As a result it is the most investigated multiferroic material. In this study, bismuth ferrite thin films were deposited on silicon wafer (100) and glass by pulsed-laser deposition and their structural, optical, and electrical properties were measured. Our study indicates that Bi richness in these films can stimulate formation of oxygen vacancy in the system which in its turn leads to delocalization of carriers and a more intensified photoconductivity response. X-ray diffraction analysis revealed formation of BiFeO_3 (BFO), but it also showed formation of Bi_2O_3 and Bi_2O_2.3 as well as BFO. Energy dispersive spectrum (EDS) also showed higher atomic concentration of Bi with respect to Fe. It also disclosed Bi depletion through the films during post-growth heat treatment. Atomic force microscopy showed a homogeneous nano structure with columnar grains. It also disclosed that higher substrate temperature can improve smoothness of the films. Scanning electron microscopy depicted the thickness of about 200 nm. Transmission spectrum illus trated band gap of about 2 eV. Dark-light IV characteristics were conducted on the films which were subjected to post-growth heat treatment at 0.01 and 760 Torr O_2. Dark conductivities increased by an order of magnitude in comparison between films which were subjected to post- growth heat treatment at 0.01 and 760 Torr O_2. Dark-light IV characteristics of the films also uncovered a remarkable increase in conductivity under illumination in comparison to dark one. Diode behavior of the films was investigated by IV characteristics as well.
机译:铋铁氧体BiFeO_3几乎是唯一在室温下同时具有磁性和强铁电性的材料。结果,它是研究最多的多铁性材料。在这项研究中,通过脉冲激光沉积在硅晶片(100)和玻璃上沉积了铋铁氧体薄膜,并测量了它们的结构,光学和电学性质。我们的研究表明,这些薄膜中的Bi丰富度可以刺激系统中氧空位的形成,进而导致载流子离域和更强的光电导响应。 X射线衍射分析表明形成了BiFeO_3(BFO),但也表明形成了Bi_2O_3和Bi_2O_2.3以及BFO。能量色散谱(EDS)也显示出Bi相对于Fe的原子浓度更高。还公开了在生长后热处理期间穿过膜的Bi耗尽。原子力显微镜显示具有圆柱状晶粒的均匀纳米结构。还公开了更高的基板温度可以改善膜的光滑度。扫描电子显微镜描绘了约200nm的厚度。透射光谱说明带隙约为2 eV。在经过0.01和760 Torr O_2的生长后热处理的薄膜上进行了暗光IV特性测试。与在0.01和760 Torr O_2下进行生长后热处理的薄膜相比,暗电导率增加了一个数量级。薄膜的暗光IV特性与暗光相比,在照明下的电导率也显着提高。还通过IV特性研究了膜的二极管行为。

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  • 来源
    《Journal of materials science》 |2011年第7期|p.815-820|共6页
  • 作者单位

    Department of Materials Science and Engineering, Sharif University of Technology, P.O. Box 11155-9466, Azadi Ave., Tehran, Iran;

    Physics Department, Sharif University of Technology,P.O. Box 11365-9466, Azadi Ave., Tehran, Iran,Institute for Nanoscience and Nanotechnology, Sharif University of Technology, P.O. Box 14588-89694, Azadi Ave., Tehran, Iran;

    Department of Materials Science and Engineering, Sharif University of Technology, P.O. Box 11155-9466, Azadi Ave., Tehran, Iran;

    Department of Materials Science and Engineering, Sharif University of Technology, P.O. Box 11155-9466, Azadi Ave., Tehran, Iran;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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