Preparation of La_2NiMnO_6 thin films on Pt/TiO_2/SiO_2/Si substrates by pulsed laser deposition

摘要

Double perovskite La_2NiMnO_6 thin films were prepared on Pt/TiO_2/SiO_2/Si substrates by the pulsed laser deposition process, and the crystal structure and micro-structures were investigated. The temperature and the oxygen pressure played the primary roles dominating the crystallization behavior and the morphology of La_2NiMnO_6 thin films. The well crystallized La_2NiMnO_6 thin films could be obtained at 873 and 923 K under all oxygen pressures investigated here, and the fine morphology was obtained under the oxygen pressures equal to or higher than 50 and 100 Pa, respectively, while phase constitution was significantly affected by the oxygen pressure for La_2NiMnO_6 thin films prepared at 1,023 K where the higher oxygen pressure led to the appearance of some secondary phase.