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Deposition and characterization of Cu_2ZnSnS_4 thin films for photovoltaic applications

机译:用于光伏应用的Cu_2ZnSnS_4薄膜的沉积和表征

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摘要

Cu_2ZnSnS_4 thin films were successfully deposited on glass substrates by a chemical bath deposition method for as-deposited and annealed films with different temperatures in sulphur atmosphere at 250 and 350 ℃. The changes in structural and the optical phenomenon of as -deposited and annealed films have been studied. The powder X-ray diffraction (XRD) spectra show the tetragonal crystal structure of Cu_2ZnSnS_4(CZTS) thin films. The average crystallite size varies from 19.437 to 17.937 and 10.41 nm respectively, when the film was as-deposited and annealed at 250 and 350 ℃. The surface morphologies of the as-grown surface show some voids with agglomerated particles. After sulphurization at 250 and 350 ℃, the morphologies of the samples become dense. The band gap is estimated to be about 1.11 eV for the as-deposited film and 1.42 and 1.5 eV for the annealed films.
机译:采用化学浴沉积法在不同温度下于250和350℃的硫气氛下沉积和退火成膜的薄膜,成功地在玻璃基板上沉积了Cu_2ZnSnS_4薄膜。研究了沉积和退火膜的结构和光学现象的变化。粉末X射线衍射(XRD)光谱显示Cu_2ZnSnS_4(CZTS)薄膜的四方晶体结构。在250和350℃进行沉积和退火时,平均晶粒尺寸分别在19.437〜17.937和10.41 nm之间。刚生长的表面的表面形态显示出一些带有聚集颗粒的空隙。在250和350℃硫化后,样品的形貌致密。对于沉积的膜,带隙估计为大约1.11 eV,对于退火的膜,带隙估计为大约1.42和1.5 eV。

著录项

  • 来源
    《Journal of materials science》 |2016年第12期|13229-13234|共6页
  • 作者

    A. Vasuhi; R. John Xavier;

  • 作者单位

    PG and Research Department of Physics, H.H. The Rajah's College (Autonomous), Pudukkottai, Tamilnadu, India;

    PG and Research Department of Physics, Periyar E.V.R.College, Tiruchirappalli, Tamilnadu, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
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