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Enhancement in the thermoelectric properties of Cu_3SbSe_4 by Sn doping

机译:Sn掺杂增强Cu_3SbSe_4的热电性能

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摘要

The solid-state reaction technique was employed to fabricate Sn doped Cu3SbSe4 samples. The effect of doping on structural and thermoelectric properties of Cu3SbSe4 samples is represented in the present communication. The powder X-ray diffraction pattern of all the samples show that they have tetragonal structure (space group I4 over bar 2m. It is observed that doping Sn at Sb site acts as acceptor dopant which enhances hole concentration. The temperature dependent electrical resistivity (rho(T)) is observed to decrease with increase in Sn concentration up to x = 0.03, thereafter rho(T) increases with the increase in x concentration. To explore the conduction mechanism, we have employed small poloron hopping (SPH) model to the rho(T) data and the results indicate that SPH is operative in the high temperature regime for all samples. The data of Seebeck coefficient (S(T)) confirms that holes are the majority charge carriers for pristine as well as doped samples. The analysis of S(T) data reveals that all the samples have a narrow band gap. The contribution from electron thermal conductivity is found to be less than 1%, thus the total conductivity is mainly because of phonon thermal conductivity. The highest value of dimensionless figure of merit (ZT = 0.127) was achieved at 374 K for the sample Cu3Sb0.99Sn0.01Se3 which is slightly higher than that of the pristine sample (ZT = 0.115). The highest value of compatibility factor (0.98 V-1) was observed for the sample Cu3Sb0.98Sn0.02Se3 at 374 K.
机译:采用固态反应技术制备了掺Sn的Cu3SbSe4样品。掺杂对Cu3SbSe4样品的结构和热电性能的影响在本来文中已介绍。所有样品的粉末X射线衍射图表明它们具有四方结构(在2m以上的空间是I4族。观察到Sb位点处的Sn掺杂起受体掺杂剂作用,增加了空穴浓度。 (T))随Sn浓度的增加而降低,直至x = 0.03,此后rho(T)随着x浓度的增加而增加,为探讨传导机理,我们采用了小型Poloron跳跃(SPH)模型rho(T)数据和结果表明,SPH在所有样品中均能在高温条件下工作,塞贝克系数(S(T))的数据证实,空穴是原始样品和掺杂样品的主要电荷载体。对S(T)数据的分析表明,所有样品都具有窄的带隙,电子热导率的贡献小于1%,因此总电导率主要是由于声子的热导率。 Cu3Sb0.99Sn0.01Se3样品在374 K时获得的最大量纲品质因数(ZT = 0.127)最大,略高于原始样品(ZT = 0.115)。在374 K下观察到样品Cu3Sb0.98Sn0.02Se3的相容性因子(0.98 V-1)最高。

著录项

  • 来源
    《Journal of materials science》 |2019年第17期|16596-16605|共10页
  • 作者

    Prasad K. Shyam; Rao Ashok;

  • 作者单位

    Manipal Acad Higher Educ Manipal Inst Technol Dept Phys Manipal 576104 Karnataka India|NMAM Inst Technol Dept Phys Nitte 574110 India;

    Manipal Acad Higher Educ Manipal Inst Technol Dept Phys Manipal 576104 Karnataka India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
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