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Exploring NiO nanosize structures for ammonia sensing

机译:探索用于氨感测的NiO纳米结构

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摘要

Efficient ammonia gas sensor devices were fabricated based on nickel oxide (NiO) nanostructures films. Two chemical synthesis approaches were used: chemical spray pyrolysis (CSP) and chemical bath deposition (CBD), aiming at obtaining highly developed surface area and high chemical reactivity of NiO. Crystal structure, morphology, and composition of NiO films and nanostructures were investigated by scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy. CSP method results in the synthesis of NiO films with pure cubic crystalline structure of preferred orientation along (111) direction. The type of the precursors used (nickel acetate, nickel chloride and nickel nitrate) affects the morphology and crystallites average size of the deposited films. CBD method consisted of two stages: (i) deposition of nickel hydroxide phase and (ii) thermal annealing of nickel hydroxide at 450 °C in air for 4 h. Resulted structures were nanoflakes, vertically arranged in a “wall-like” morphology. Fabricated structures were found to be sensitive to ammonia differently, depending on the synthesis approach and material morphology. NiO films deposited by CBD demonstrated a stable response to ammonia with maximum magnitude at the operating temperature of 300 °C. The highest average response for the CBD–NiO sample was 114.3–141.3% for 25 and 150 ppm NH~(3), respectively, whereas the response range observed for the film processed by spray pyrolysis using nickel chloride was 31.7–142.5% for 25 and 150 ppm NH~(3), respectively.
机译:基于氧化镍(NiO)纳米结构薄膜制造了高效的氨气传感器设备。使用两种化学合成方法:化学喷雾热解(CSP)和化学浴沉积(CBD),旨在获得高度发达的NiO表面积和高化学反应性。通过扫描电子显微镜,X射线衍射和X射线光电子能谱研究了NiO膜和纳米结构的晶体结构,形态,组成。 CSP方法可合成具有沿(111)方向具有最佳取向的纯立方晶体结构的NiO薄膜。所用前体的类型(乙酸镍,氯化镍和硝酸镍)会影响沉积膜的形貌和微晶平均尺寸。 CBD方法包括两个阶段:(i)氢氧化镍相的沉积和(ii)氢氧化镍在450°C的空气中热退火4小时。得到的结构是纳米薄片,垂直排列成“壁状”形态。发现合成的结构对氨的敏感性不同,这取决于合成方法和材料形态。通过CBD沉积的NiO膜在300°C的工作温度下显示出对氨的稳定响应,且幅度最大。对于25和150 ppm NH〜(3),CBD–NiO样品的最高平均响应分别为114.3–141.3%,而对于使用氯化镍喷雾热解处理的薄膜,其响应范围在25%时为31.7–142.5%。和150 ppm NH〜(3)。

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