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首页> 外文期刊>Journal of Materials Research >Surface-oxidation studies of cube-textured, pure nickel to form NiO as a potential YBa_2Cu_3O_(7-x)-coated conductor buffer layer
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Surface-oxidation studies of cube-textured, pure nickel to form NiO as a potential YBa_2Cu_3O_(7-x)-coated conductor buffer layer

机译:立方织构纯镍表面氧化研究以形成NiO作为潜在的YBa_2Cu_3O_(7-x)涂层导体缓冲层

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摘要

The growth of nickel oxide (NiO) on {100} <001> cube textured, rolling-assisted biaxially textured substrates (RABiTS) of pure nickel was studied. Single-phase (100) NiO formed only in a narrow temperature range at 1250 +- 5℃. At lower or higher temperatures, other orientations, namely (111), (311), and (220), also formed. At 1250℃, practically single phase (100) NiO was observed for short oxidation times t of 0.2―℃10 min (oxide thickness < 10 (μm). For 10 < t < 120 min, small quantities of (111) NiO formed in addition to (100), but near-single-phase (100) NiO formed once again after oxidation for >150 min (thickness > 35 μm). The ratio of (100) to (111) textures with oxidation time is explained in terms of epitaxial constraints, growth rates, and oxygen absorption on the (100) and (111) grains. The optimum oxidation conditions are oxidation for approximately 0.5 min at 1250℃ in flowing oxygen, yielding (100) NiO, a few microns in thickness, and root-mean-square roughness of approximately 40 nm on the length-scale of the grain size.
机译:研究了氧化镍(NiO)在{100} <001>立方织构的,轧制辅助双轴织构的纯镍衬底(RABiTS)上的生长。单相(100)NiO仅在1250±5℃的狭窄温度范围内形成。在较低或较高的温度下,也形成其他取向,即(111),(311)和(220)。在1250℃时,观察到几乎单相(100)NiO,氧化时间t较短,为0.2-℃10分钟(氧化层厚度<10(μm)。10 150分钟(厚度> 35μm)后再次形成近单相(100)NiO。(100)与(111)织构的比率随氧化时间的解释如下: (100)和(111)晶粒的外延约束,生长速率和氧吸收的最佳氧化条件是:在1250℃下在流动的氧气中氧化约0.5分钟,生成(100)NiO,厚度为几微米,且在晶粒尺寸的长度尺度上的均方根粗糙度约为40 nm。

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