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Effects of electromigration on interfacial reactions in cast Sn/Cu joints

机译:电迁移对铸锡/铜接头界面反应的影响

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摘要

The Sn/Cu/Sn/Cu/Sn sandwich-type couples prepared by the casting method are used for examining the effects of electromigration on Sn/Cu interfacial reactions. The samples are reacted at 170 and 180℃ for 24-240 h by passing an electric current with a density of 5000 A/cm~2. At the interfaces where electrons flow from the Sn side to the Cu side, uniform layers of Cu_6Sn_5 and Cu_3Sn are formed. The results are similar to those without passage of an electric current. The relatively thicker Cu_6Sn_5 layer is attributed to the extra Cu source from the dissolved Cu during the sample preparation. At the interfaces where electrons flow from the Cu side to the Sn side, large and nonplanar Cu_6Sn_5 phase regions are formed. Formation of large Cu_6Sn_5 regions is the result of electromigration-enhanced Cu diffusion through the grain boundaries and surfaces.
机译:通过流延法制备的Sn / Cu / Sn / Cu / Sn夹心型偶被用于检查电迁移对Sn / Cu界面反应的影响。通过以5000 A / cm〜2的电流通过,使样品在170和180℃下反应24-240小时。在电子从Sn侧流向Cu侧的界面处,形成均匀的Cu_6Sn_5和Cu_3Sn层。结果类似于没有通过电流的结果。相对较厚的Cu_6Sn_5层归因于样品制备过程中来自溶解的Cu的额外Cu源。在电子从Cu侧流向Sn侧的界面处,形成大且非平面的Cu_6Sn_5相区域。大Cu_6Sn_5区域的形成是电迁移增强的Cu通过晶界和表面扩散的结果。

著录项

  • 来源
    《Journal of Materials Research 》 |2007年第3期| p.695-702| 共8页
  • 作者

    Sinn-Wen Chen; Chao-Hong Wang;

  • 作者单位

    Department of Chemical Engineering, National Tsing Hua University, Hsin-chu, Taiwan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学 ;
  • 关键词

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