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首页> 外文期刊>Journal of Lightwave Technology >Low-loss near-infrared passive optical waveguide components formed by electron beam irradiation of silica-on-silicon
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Low-loss near-infrared passive optical waveguide components formed by electron beam irradiation of silica-on-silicon

机译:通过硅上硅电子束辐照形成的低损耗近红外无源光波导组件

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Results are presented for a range of near infrared single-mode passive channel waveguide optical components fabricated in PECVD silica-on-silicon by electron beam irradiation. The devices include S-bends, Mach-Zehnder interferometers, Y-junction tree-structured splitters, and directional couplers. It is shown that low loss may be obtained through appropriate choice of waveguide bend radius and fabrication parameters; fiber-device insertion losses of /spl ap/2 dB and /spl ap/1 dB are achieved for 1/spl times/8 splitters and 3-dB directional couplers, respectively, at /spl lambda/=1.525 /spl mu/m.
机译:给出了通过电子束辐照在PECVD硅基二氧化硅上制造的一系列近红外单模无源通道波导光学组件的结果。这些设备包括S型弯头,Mach-Zehnder干涉仪,Y型结树形分路器和定向耦合器。结果表明,通过适当选择波导弯曲半径和制造参数可以获得低损耗。 / splλ/ 8分路器和3-dB定向耦合器分别达到/ spl ap / 2 dB和/ spl ap / 1 dB的光纤设备插入损耗,分别为/ spl lambda / = 1.525 / spl mu / m 。

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