Characterization of optical waveguides fabricated by electron beam irradiation of fused silica.

摘要

An alternative method of writing optical waveguides in fused silica for use in integrated optics is characterized. Silica substrates were irradiated with an electron beam of 20 keV energy to create single-mode channel waveguides. Using irradiation dosage of 0.35 Coulombs/cm;The high power attenuation observed may limit the process's applications in the visible region. However, due to its speed and flexibility, it has the potential to offer a better alternative to the currently used ion-exchanged process for infrared region applications. Gradient-index components and novel geometries could be created. The feasibility of using the process for fabrication of passive optical components has been demonstrated through fabrication of directional couplers.