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首页> 外文期刊>Journal of Lightwave Technology >Scanning near-field optical microscope for the characterization of optical integrated waveguides
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Scanning near-field optical microscope for the characterization of optical integrated waveguides

机译:扫描近场光学显微镜用于表征光学集成波导

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摘要

A scanning near-field optical microscope for the characterization of optical integrated devices has been developed. Compatible with a normal optical characterization setup the experimental setup allows a tapered uncoated optical fiber to scan the optical device with constant height by means of a shear force control using a tuning fork, and to obtain the evanescent field emerging from it. In this way, images showing simultaneously the topography with lateral resolution better than 10 nm and vertical resolution of 1 nm, and the optical field distribution have been obtained. Images obtained over rib waveguides show the guided mode intensity distribution, allowing characterization of the propagation of the light in the device for up to 1 mm. Identification of the guided mode propagation has been achieved by comparing the images with computer simulations. Measurement of the experimental decay lengths of the evanescent field obtained by the microscope allows a determination of the effective refractive index of the structure to be made.
机译:已经开发出用于表征光学集成装置的扫描近场光学显微镜。与常规的光学特性设置兼容,实验设置允许锥形未涂层光纤通过使用音叉的剪切力控制来扫描具有恒定高度的光学设备,并从中获得渐逝场。以此方式,获得了同时显示具有大于10nm的横向分辨率和1nm的垂直分辨率的横向形貌的图像以及光场分布的图像。在肋形波导上获得的图像显示了导模强度分布,从而可以表征设备中长达1 mm的光的传播。通过将图像与计算机模拟进行比较,可以识别出引导模式传播。通过显微镜获得的the逝场的实验衰减长度的测量值使得可以确定待构造结构的有效折射率。

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