Ridged LiNbO$_{3}$ Waveguide Fabricated By a Novel Wet Etching/MeV Oxygen Ion Implantation Method

摘要

We report on a new wet etching/ion implantation method for fabricating ridge waveguide on z -cut LiNbO3. The ridge structures are produced on LiNbO3 crystal by anisotropic wet etching via minus z face. Mode guiding at wavelength of 632.8 nm has been realized by using direct 4.5 MeV oxygen implantation without any implantation mask. The ridge waveguide shows a reduced propagation loss of 1.3 dB/cm after the thermal annealing process.