Effect of Substrate Temperatures on Structural and Morphological Properties of Nano-Crystalline Silver Thin Films Grown on Silicon Substrates

摘要

The silver (Ag) thin films were deposited on silicon substrates by DC magnetron sputtering method under different substrate temperatures of 100-500 A degrees C. Then the as-deposited films were subjected to annealing treatment. The XRD results revealed that the Ag thin films have a good nanocrystalline structure and a considerable increase in the crystallinity of Ag (111) peak was observed at substrate temperature of 200 A degrees C. The average crystalline size of Ag films varied between 18 and 44 nm which confirms the presence of nanocrystal's in the films. The AFM and SEM images demonstrated that the grain size and surface roughness of the films are sensitive to substrate temperature during deposition of the films and annealing treatment. The SEM results is in good agreement with the results of XRD and AFM analysis.