N_2O removal in N_2 or air by ArF excimer laser photolysis at atmospheric pressure

摘要

A photochemical process is proposed as a new efficient N_2O removal technique in N_2 or air at atmospheric pressure and room temperature without using any catalysts. N_2O diluted in N_2 or air was decomposed into N_2, O_2, and NO by using a 193 nm ArF excimer laser. The maximum conversion of N_2O in N_2O/N_2 or N_2O/N_2/O_2 mixtures was 93% at a laser power of 136 mJ, a repetition frequency of 5 Hz, and an irradiation time of 30 min. The formation ratios of N_2:O_2:NO in N_2O/N_2 and N_2O/N_2/O_2 mixtures were 64:31:5.1 % and 60:27:13%, respectively. The decomposition mechanism of N_2O under 193 nm photolysis was discussed by comparing experimental data with calculated model using known photochemical and gas kinetic data.