'Defect Gradient to Boost Nonvolatile Memory Performance' in Patent Application Approval Process

摘要

2013 MAR 27 (VerticalNews) -- By a News Reporter-Staff News Editor at Journal of Engineering -- Anpatent application by the inventors Wang, Yun (San Jose, CA); Chiang, Tony (Campbell, CA); Hashim,nImran (Saratoga, CA), filed on September 1, 2011, was cleared for further review on March 14, 2013,naccording to news reporting originating from Washington, D.C., by VerticalNews correspondents.