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Magnetic Flux Pinning in Epitaxial YBa_2Cu_3O_(7-δ) Thin Films

机译:外延YBa_2Cu_3O_(7-δ)薄膜的磁通钉扎

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The influence of microstructure on the critical current density of laser ablated YBa_2Cu_3O_(7-δ) thin films has been examined. Scanning tunneling microscopy was used to examine the morphologies of YBa_2Cu_3O_(7-δ) films and the morphology data were then correlated with measurements of the critical current density. The films were found to grow by an island nucleation and growth mechanism. The critical current densities of the films are similar to those of films with screw dislocation growth, indicating that screw dislocation growth is not necessary for good pinning. The data suggest that the critical current density in applied magnetic field may be higher in films with higher densities of growth features.
机译:研究了微观结构对激光烧蚀YBa_2Cu_3O_(7-δ)薄膜临界电流密度的影响。用扫描隧道显微镜检查了YBa_2Cu_3O_(7-δ)薄膜的形貌,然后将形貌数据与临界电流密度的测量结果进行了关联。发现这些膜通过岛状成核和生长机制生长。膜的临界电流密度与具有螺钉位错生长的膜的临界电流密度相似,这表明螺钉位错生长对于良好的钉扎不是必需的。数据表明,在具有更高生长特征密度的薄膜中,施加磁场中的临界电流密度可能更高。

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