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首页> 外文期刊>Journal of Electronic Materials >Interfacial Reactions of Si Die Attachment with Zn-Sn and Au-20Sn High Temperature Lead-Free Solders on Cu Substrates
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Interfacial Reactions of Si Die Attachment with Zn-Sn and Au-20Sn High Temperature Lead-Free Solders on Cu Substrates

机译:铜基板上硅片与锌锡和金20锡高温无铅焊料的界面反应

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摘要

The interfacial reaction of Si die attachment with a high temperature lead-free solder of Zn-xSn (x = 20 wt.%, 30 wt.% and 40 wt.%) was investigated, and the currently used high temperature lead-free solder of Au-20Sn was compared. A sound die attachment to a Cu substrate can be achieved with Zn-Sn solder. No intermetallic compound (IMC) phase was observed in the solder layer, and only primary α-Zn and Sn-Zn eutectic phases were observed. At the interface with the Si die, with a metallization of Au/Ag/Ni, an AgAuZn2, IMC layer was formed along the interface, and the Ni coating layer did not react with the solder. At the interface with the Cu substrate, CuZn5 and Cu5Zn8 IMC layers were confirmed, and their thicknesses can be controlled by soldering conditions. During multiple reflows, the growth of these IMC layers was observed, but no additional voids or cracks were observed. For more reliable die attachment, a titanium nitride (TiN) coating layer was applied to suppress the formation of Cu-Zn IMCs. The Si die attached joint on the TiN-coated Cu was quite stable during the multiple reflows, and no visible IMC phase was confirmed in the interfacial microstructure.
机译:研究了Si芯片与Zn-xSn高温无铅焊料(x = 20 wt。%,30 wt。%和40 wt。%)的界面反应,并研究了目前使用的高温无铅焊料比较了Au-20Sn的含量。可以使用Zn-Sn焊料将晶粒牢固地附着在Cu基板上。在焊料层中未观察到金属间化合物(IMC)相,仅观察到初级α-Zn和Sn-Zn共晶相。在与Si芯片的界面处,通过​​Au / Ag / Ni的金属化,形成AgAuZn 2 ,沿界面形成了IMC层,并且Ni涂层没有与焊料反应。在与Cu衬底的界面处,确认了CuZn 5 和Cu 5 Zn 8 IMC层,并且可以通过焊接条件控制其厚度。在多次回流期间,观察到这些IMC层的生长,但未观察到其他空隙或裂纹。为了更可靠地固定芯片,应用了氮化钛(TiN)涂层来抑制Cu-Zn IMC的形成。在多次回流过程中,TiN包覆的Cu上的Si芯片连接接头非常稳定,并且在界面微结构中未确认到可见的IMC相。

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