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首页> 外文期刊>Journal of Crystal Growth >Growth of SiGe bulk crystals with uniform composition by utilizing feedback control system of the crystal-melt interface position for precise control of the growth temperature
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Growth of SiGe bulk crystals with uniform composition by utilizing feedback control system of the crystal-melt interface position for precise control of the growth temperature

机译:通过利用晶体熔体界面位置的反馈控制系统精确控制生长温度来生长具有均匀组成的SiGe块状晶体

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摘要

We developed an automatic feedback control system of the crystal-melt interface position to keep the temperature at the interface constant during growth, and demonstrate its successful application to grow Ge-rich SiGe bulk crystals with uniform composition. In this system, the position of the crystal-melt interface was automatically detected by analyzing the images captured using in situ monitoring system based on charge-coupled-devices camera, and the pulling rate of the crucible was corrected at every 1 min. The system was found to be effective to keep the crystal-melt interface position during growth even when the variation of the growth rate is quite large. Especially, the interface position was kept for 470 h during growth of Ge-rich SiGe bulk crystal when we started with a long growth melt of 80mm. As a result, a 23mm-long Si_(0.22)Ge_(0.78) bulk crystal with uniform composition was obtained thanks to the constancy of the growth temperature during growth through the control of the interface position. Our technique opens a possibility to put multicomponent bulk crystal in a practical use.
机译:我们开发了晶体熔体界面位置的自动反馈控制系统,以在生长过程中保持界面温度恒定,并证明了其在生长具有均匀组成的富Ge的SiGe块状晶体方面的成功应用。在该系统中,通过分析使用基于电荷耦合器件相机的原位监控系统捕获的图像来自动检测晶体熔体界面的位置,并每1分钟校正一次坩埚的提拉速度。发现该系统即使在生长速率的变化非常大的情况下也可有效地保持生长期间的晶体熔体界面位置。特别是,当我们开始生长80mm长的熔体时,在富Ge的SiGe块状晶体的生长过程中,界面位置保持了470小时。结果,由于通过控制界面位置在生长期间的生长温度的恒定性,获得了具有均匀组成的23mm长的Si_(0.22)Ge_(0.78)块状晶体。我们的技术为将多组分块状晶体投入实际使用开辟了可能性。

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