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Viscosity of molten silicon and the factors affecting measurement

机译:熔融硅的粘度及其影响测量的因素

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Viscosity of molten silicon has been measured to study the behavior, especially around the melting point, in order to supply useful information for the crystal growth of semiconductors. The temperature range was taken as wide as possible from 1891 K down to the supercooled region by using an oscillating viscometer with various materials of crucible to study the effect of the materials. It has been clear that the viscosity of molten silicon showed a good Arrhenian behavior in the entire temperature range including the supercooled region and no abnormal increase around the melting point. The viscosity values were lower than the reported values and the maximum difference reached 50% even in the temperatures sufficiently higher than the melting point. Furthermore, almost no effect on the measurement by the materials of crucible was found. The recommended viscosity is presented by the following equation based on the present results: log η/mPas s= -0.727 + 819/T, E_η = 15.7 kJ mol~(-1). The viscosity and the activation energy were considerably lower than those of other metals with high melting points and the reason was considered to be due to the looser structure of the molten silicon originated from diamond-type solid structure.
机译:已测量熔融硅的粘度以研究其行为,尤其是在熔点附近的行为,以便为半导体的晶体生长提供有用的信息。通过使用带有各种坩埚材料的振荡粘度计,研究从1891 K到低温区域的温度范围,以研究材料的效果。显然,熔融硅的粘度在包括过冷区域在内的整个温度范围内均表现出良好的阿伦尼行为,并且在熔点附近没有异常增加。粘度值低于报告值,即使在充分高于熔点的温度下,最大差也达到了50%。此外,几乎没有发现坩埚材料对测量的影响。根据目前的结果,推荐粘度由以下方程式表示:logη/ mPas s = -0.727 + 819 / T,E_η= 15.7 kJ mol〜(-1)。粘度和活化能明显低于其他具有高熔点的金属,并且其原因被认为是由于源自金刚石型固体结构的熔融硅的较松散的结构。

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