首页> 外文期刊>Journal of Crystal Growth >Three-dimensional modeling of melt flow and interface shape in the industrial liquid-encapsulated Czochralski growth of GaAs
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Three-dimensional modeling of melt flow and interface shape in the industrial liquid-encapsulated Czochralski growth of GaAs

机译:GaAs工业液体封装的切克劳斯基生长过程中熔体流动和界面形状的三维建模

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摘要

The heat transport in the melt and in the crystal including the interface shape was numerically investigated by local, fully three-dimensional (3D), time-dependent simulations for an industrially sized liquid-encapsulated Czochralski setup for growing GaAs crystals with 150 mm diameter. The thermal boundary conditions for the local 3D simulations were obtained from global quasi-steady 2D simulations. It was found that the type of thermal boundary conditions (fixed temperature or heat flux) has a strong influence on the 3D results of the interface shape and on the melt convection. Furthermore, a high sensitivity of the interface deflection on the temperature at the bottom wall of the crucible is observed. For a control of the interface shape the use of two types of magnetic fields (horizontal and vertical) was considered. It was found that a horizontal magnetic field has a bigger influence on the interface shape than a vertical magnetic field.
机译:通过局部,完全三维(3D)时变仿真,对工业规模的液体封装的Czochralski装置,以生长直径为150 mm的GaAs晶体进行了数值模拟,研究了熔体和晶体中包括界面形状的热传递。局部3D模拟的热边界条件是从整体拟稳态2D模拟获得的。已经发现,热边界条件的类型(固定温度或热通量)对界面形状的3D结果和熔体对流有很大影响。此外,观察到界面偏转对坩埚底壁温度的高敏感性。为了控制界面形状,考虑使用两种类型的磁场(水平磁场和垂直磁场)。发现水平磁场比垂直磁场对界面形状的影响更大。

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