首页> 外文期刊>Journal of Crystal Growth >Photoluminescence study of Si-doped (1120) a-plane GaN grown on (1102) r-plane sapphire by metalorganic chemical vapor deposition
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Photoluminescence study of Si-doped (1120) a-plane GaN grown on (1102) r-plane sapphire by metalorganic chemical vapor deposition

机译:金属有机化学气相沉积在(1102)r面蓝宝石上生长的Si掺杂(1120)a面GaN的光致发光研究

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Reasonable quality Si-doped (1120) a-plane GaN have been grown by metalorganic chemical vapor deposition on (1102) r-plane sapphire substrates. Optical properties of the films were studied by photoluminescence spectroscopy. Our experimental results suggest that not V_(Ga) but the V_(Ga)-O_N complex is the key defect responsible for yellow luminescence in GaN. At 12.9 K, free exciton A, donor bound exciton and exciton bound to neutral acceptor (I-x), which are similar to (0001) GaN are observed. Different to (0001) GaN, the longitudinal optical and transverse optical phonon replicas are found emerging simultaneously. Another peak at 3.42eV is interpreted as donor-acceptor pair transition.
机译:通过在(1102)r面蓝宝石衬底上进行金属有机化学气相沉积,已经生长出质量合理的掺Si(1120)a面GaN。通过光致发光光谱研究了膜的光学性质。我们的实验结果表明,不是V_(Ga)而是V_(Ga)-O_N络合物是造成GaN中黄色发光的关键缺陷。在12.9 K处,观察到与(0001)GaN相似的自由激子A,施主结合的激子和与中性受体(I-x)结合的激子。与(0001)GaN不同,发现纵向光学和横向光学声子复制品同时出现。在3.42eV处的另一个峰被解释为供体-受体对跃迁。

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