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Light emission from as-prepared and oxidized Si nanowires with diameters of 5-15 nm

机译:制备和氧化后的直径为5-15 nm的Si纳米线的光发射

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Using Fe as catalyser, Si nanowires (SiNWs) with diameters of 5-15 nm and lengths of ~μm were synthesized via vapor-liquid-solid growth method at high temperature. The as-prepared SiNWs with the Raman peak positions of ≤ 511 cm~(-1) show a strong photoluminescence (PL) peak centered at 745 nm. The position of the PL peak exhibits no dependence on the SiNW diameters, but its intensity increases with decreasing the SiNW diameters. When the as-prepared SiNWs were gradually oxidized, the 745 nm PL peak reduces its intensity and meantime a new PL peak appears at 620 nm. When the SiNWs were completely oxidized, the 745 nm PL vanishes and the 620 nm PL peak reaches its maximal intensity. Spectral analyses and microstructural observations suggest that the 745 nm PL arises from optical transition in the interfacial defect states between the SiNW core and the surface Si oxide, whereas the photogeneration of carriers takes place in the quantum confined SiNW core. Based on the electron paramagnetic resonance result, we correlate the 620 nm PL with the nonbridging oxygen hole centers at the surfaces of the SiNWs.
机译:以Fe为催化剂,通过高温气液固相生长法合成了直径为5〜15 nm,长度为〜μm的Si纳米线。制备的拉曼峰位置≤511 cm〜(-1)的SiNW表现出以745 nm为中心的强光致发光(PL)峰。 PL峰的位置不依赖于SiNW直径,但是其强度随SiNW直径的减小而增加。当所制备的SiNW逐渐被氧化时,745 nm的PL峰强度降低,同时在620 nm处出现新的PL峰。当SiNWs被完全氧化时,745 nm PL消失,620 nm PL峰达到其最大强度。光谱分析和微观结构观察表明,745 nm PL是由SiNW核与表面Si氧化物之间界面缺陷状态的光学跃迁引起的,而载流子的光生发生在量子约束的SiNW核中。基于电子顺磁共振结果,我们将620 nm PL与SiNWs表面的非桥接氧孔中心相关联。

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