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Electron microscopy studies of epitaxial MgB_2 superconducting thin films grown by in situ reactive evaporation

机译:原位反应蒸发生长的外延MgB_2超导薄膜的电子显微镜研究

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The morphology and chemistry of epitaxial MgB_2 thin films grown using reactive Mg evaporation on different substrates have been characterized by transmission electron microscopy methods. For polycrystalline alumina and sapphire substrates with different surface planes, an MgO transition layer was found at the interface region. No such layer was present for films grown on MgO and 4-H SiC substrates, and none of the MgB_2 films had any detectable oxygen incorporation nor MgO inclusions. High-resolution electron microscopy revealed that the growth orientation of the MgB_2 thin films was closely related to the substrate orientation and the nature of the intermediary layer. Electrical measurements showed that very low resistivities (several μ? cm at 300 K) and high superconducting transition temperatures (38 to 40 K) could be achieved. The correlation of electrical properties with film microstructure is briefly discussed.
机译:利用透射电子显微镜方法对利用反应性镁蒸发在不同衬底上生长的外延MgB_2薄膜的形貌和化学性质进行了表征。对于具有不同表面平面的多晶氧化铝和蓝宝石衬底,在界面区域发现了MgO过渡层。对于在MgO和4-H SiC衬底上生长的薄膜,不存在这样的层,并且MgB_2薄膜都没有可检测到的氧掺入或MgO夹杂物。高分辨率电子显微镜显示,MgB_2薄膜的生长方向与衬底方向和中间层的性质密切相关。电气测量结果表明,可以实现极低的电阻率(在300 K时几μ?cm)和高超导转变温度(38至40 K)。简要讨论了电性能与薄膜微观结构的关系。

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