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首页> 外文期刊>Journal of Crystal Growth >Room-temperature yellow-amber emission from InGaP quantum wells grown on an InGaP metamorphic buffer layer on GaP(100) substrates
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Room-temperature yellow-amber emission from InGaP quantum wells grown on an InGaP metamorphic buffer layer on GaP(100) substrates

机译:在GaP(100)衬底上的InGaP变质缓冲层上生长的InGaP量子阱的室温黄琥珀色发射

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摘要

In this paper we present a systematic investigation of the structural and optical properties of InGaP using a metamorphic InxGa1-xP buffer layer grown on GaP(100) substrates. When grown at 400 degrees C, the simpler constant-composition metamorphic buffer layer has a smoother surface morphology, as compared to that grown at 500 degrees C, and results in comparable structural quality of the top layers as a linearly graded metamorphic buffer layer. In0.5Ga0.5P quantum wells with In0.3Ga0.3P barriers grown on a constant-composition metamorphic buffer layer exhibit room-temperature bright photoluminescence in the amber wavelength at 610 nm. (c) 2005 Elsevier B.V. All rights reserved.
机译:在本文中,我们对使用在GaP(100)衬底上生长的变质InxGa1-xP缓冲层的InGaP的结构和光学性质进行了系统的研究。当在400摄氏度下生长时,与在500摄氏度下生长相比,更简单的恒定组成的变质缓冲层具有更平滑的表面形态,并导致顶层的结构质量与线性渐变的变质缓冲层相当。在恒定组成的变质缓冲层上生长具有In0.3Ga0.3P势垒的In0.5Ga0.5P量子阱在610 nm的琥珀色波长下显示室温明亮的光致发光。 (c)2005 Elsevier B.V.保留所有权利。

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