首页> 外文期刊>Journal of Crystal Growth >The influence of Mg doping on the dielectric and tunable properties of (Ba0.6Sr0.4)(0.925)K0.075TiO3 thin films fabricated by sol-gel method
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The influence of Mg doping on the dielectric and tunable properties of (Ba0.6Sr0.4)(0.925)K0.075TiO3 thin films fabricated by sol-gel method

机译:镁掺杂对溶胶-凝胶法制备(Ba0.6Sr0.4)(0.925)K0.075TiO3薄膜介电和可调性能的影响

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(Ba0.6Sr0.4)(92.5%) K-7.5% TiO3 (BSTK) thin films doped by Mg from 0 to 6 mol% were fabricated by sol-gel method on a Pt/TiO2/SiO2/Si substrate. The structure and surface morphology of Mg-doped BSTK thin films were investigated as a function of Mg concentration by X-ray diffraction and scanning electron microscopy. The dielectric measurements were conducted on metal-insulator-metal capacitors at the frequency from 100 Hz to 1 MHz and at room temperature. It is found that the Mg concentration in Mg-doped BSTK thin films has a strong influence on the material properties including surface morphology, dielectric and tunable properties. Increasing of Mg content leads to simultaneous decreasing of grain size, dielectric constant, dielectric loss and tenability of Mg-doped BSTK films. The effects of Mg doping on the microstructure, dielectric and tunable properties of Mg-doped BSTK thin films were analyzed. The BSTK thin film exhibited the highest dielectric constant of 1040 and the largest tenability of 73.6%. Mg-doped BSTK thin film (6mol%) showed the smallest dielectric loss of 0.0088 at 1 MHz. Figure of merit (FOM) of Mg-doped BSTK thin films with the optimal Mg content of 4 mol% showed maximum value of approximately 31.21 and its dielectric constant, dielectric loss and tunability were about 336, 0.014 and 44.45%, respectively. These results suggest that improved dielectric properties such as tunability and dielectric loss of 4 mol% Mg-doped BSTK films show the potential in tunable devices. (c) 2006 Elsevier B.V. All rights reserved.
机译:通过溶胶-凝胶法在Pt / TiO2 / SiO2 / Si基体上制备了(Ba0.6Sr0.4)(92.5%)K-7.5%TiO3(BSTK)的Mg掺杂浓度为0〜6 mol%。通过X射线衍射和扫描电子显微镜研究了掺Mg的BSTK薄膜的结构和表面形态随Mg浓度的变化。介电测量是在金属绝缘体-金属电容器上以100 Hz至1 MHz的频率在室温下进行的。发现掺杂Mg的BSTK薄膜中的Mg浓度对包括表面形态,介电和可调谐性质的材料性质具有强烈影响。 Mg含量的增加导致同时掺杂Mg的BSTK膜的晶粒尺寸,介电常数,介电损耗和韧性降低。分析了镁掺杂对掺镁BSTK薄膜的微观结构,介电性能和可调谐性能的影响。 BSTK薄膜表现出最高的介电常数1040和最大的延展性73.6%。掺Mg的BSTK薄膜(6mol%)在1 MHz处的最小介电损耗为0.0088。最佳Mg含量为4 mol%的Mg掺杂BSTK薄膜的品质因数(FOM)显示最大值约为31.21,介电常数,介电损耗和可调性分别约为336、0.014和44.45%。这些结果表明,改进的介电性能,例如4摩尔%的Mg掺杂BSTK薄膜的可调性和介电损耗,显示出可调器件的潜力。 (c)2006 Elsevier B.V.保留所有权利。

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