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Enhancement Of Electron Mobility In Zno Layers With Applying Ultrasonic Spray-assisted Movpe And Buffer Layers

机译:超声喷涂辅助Movpe和缓冲层增强Zno层中的电子迁移率

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Ultrasonic spray-assisted metalorganic vapor phase epitaxy (MOVPE), where the ultrasonically sprayed liquid source solution is used as the precursor of the vapor phase reaction, has been developed to grow single-crystalline ZnO and ZnMgO thin films on sapphire substrates. By applying RF sputtering-deposited ZnO buffer layers of 10-80 nm in thickness, the mobility reached 58-66 cm~2/Vs with the electron concentration of (4-9) × 10~(17)cm~(-3) at the growth temperatures of 800-900℃. The temperature dependence of mobility revealed that at room temperature the lattice scattering competed with the ionized impurity scattering, suggesting that the remarkable increase of the mobility is expected by reducing the residual impurities with purified sources. The results suggest the promising potential of the present growth method, with using safe and inexpensive source materials, as one of the MOVPE technologies contributing to mass production. On the other hand, the surface morphology and electrical properties were markedly degraded in ZnMgO, and these problems are still found to be difficult to be resolved.
机译:超声喷涂辅助的金属有机气相外延(MOVPE)技术已经开发出来,可以在蓝宝石衬底上生长单晶ZnO和ZnMgO薄膜,其中超声喷涂的液体源溶液用作气相反应的前体。通过应用RF溅射沉积的厚度为10-80 nm的ZnO缓冲层,迁移率达到58-66 cm〜2 / Vs,电子浓度为(4-9)×10〜(17)cm〜(-3)在800-900℃的生长温度下。迁移率的温度依赖性表明,在室温下,晶格散射与离子化杂质散射竞争,这表明通过纯化源减少残留杂质,可以预期迁移率显着提高。结果表明,使用安全且廉价的原材料作为具有大规模生产的MOVPE技术之一,目前的生长方法具有广阔的发展前景。另一方面,ZnMgO的表面形态和电特性显着降低,并且仍然发现这些问题难以解决。

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