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Equilibrium strain-energy analysis of coherently strained core- shell nanowires

机译:相干应变核壳纳米线的平衡应变能分析

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In order to continue the performance enhancement of Si-based semiconductor devices, the number of devices on a chip as well as the performance of those devices must continue to improve. One method for improving device functionality is the incorporation of strained Si-Ge heterostructures. While such heterostructures have been the focus of much research in planar Si processing, only recently has the fabrication of such heterostructures in nanoscale semiconductors been addressed. In particular, the fabrication of a Si-Ge radial nanowire heterostructure requires a consideration of the epitaxial stability of the shell on the underlying core nanowire. This work develops a model for the strain state of a radial nanowire heterostructure, focusing on the particular example of Si-Ge. The behavior of the radial nanowire heterostructure is compared to that of a planar heterostructure, and we find that much higher strains can be achieved in the nanowire geometry.
机译:为了继续提高基于硅的半导体器件的性能,芯片上的器件数量以及这些器件的性能必须继续提高。改善器件功能的一种方法是引入应变Si-Ge异质结构。尽管这种异质结构一直是平面硅加工中许多研究的重点,但直到最近才提出在纳米级半导体中制造这种异质结构的问题。特别地,Si-Ge径向纳米线异质结构的制造需要考虑在下面的核心纳米线上的壳的外延稳定性。这项工作着重于Si-Ge的特定示例,为径向纳米线异质结构的应变状态建立了模型。将径向纳米线异质结构的行为与平面异质结构的行为进行了比较,我们发现纳米线几何结构可以实现更高的应变。

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