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Defect characterization and composition distributions of mercury indium telluride single crystals

机译:碲化汞铟单晶的缺陷表征和组成分布

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A mercury indium telluride (MIT) ingot was grown by the vertical Bridgman method. The defects in MIT crystals were characterized by the chemical etching method. A defect etchant for MIT crystals was developed. The etch pits of dislocations, microcracks and boundary was observed by scanning electron microscopy. It was elucidated that the etch pits density of dislocations of MIT wafers was about 4 × 10~5cm~(-2). Te and In reduced at the grain boundaries, but were homogeneously distributed within the grains in the as-grown MIT crystals. The distribution of In in MIT crystals along the growth direction and radial direction was analyzed by electronic probe microscopy. It was found that In concentration was higher in the initial part and lower in the final part of the MIT ingot, which indicated that the segregation coefficient of In in MIT crystals was 1.15. The radial In concentration increased from the center to edge of the wafers and homogeneous in the middle part.
机译:通过垂直布里奇曼法生长了碲化汞铟(MIT)锭。 MIT晶体中的缺陷通过化学蚀刻方法进行了表征。开发了用于MIT晶体的缺陷蚀刻剂。通过扫描电子显微镜观察到位错,微裂纹和边界的蚀刻坑。阐明了MIT晶片的位错蚀刻坑密度约为4×10〜5cm〜(-2)。 Te和In在晶界处还原,但是在生长的MIT晶体中均匀地分布在晶粒内。通过电子探针显微镜分析了In在MIT晶体中沿生长方向和径向的分布。结果表明,在MIT晶锭的开始部分,In的浓度较高,而在最后部分,In的浓度较低,这表明MIT晶体中In的偏析系数为1.15。径向In浓度从晶片的中心到边缘增加,并且在中间部分均匀。

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